WO 2016/025290 A1

Process for reducing the level of chloride in chlorosilane ­direct process hydrolyzed substrate

(22) 06.08.2015

(43) 18.02.2016

(57) The present invention relates to a process for providing a low-chloride hydrolyzate comprising contacting an acid or base hydrolyzed substrate of a chlorosilane direct process residue with nitric acid to provide a hydrolyzate with a chloride content of less than about 1.8 % by weight. The process of present invention is especially useful in cement kilns and smelter operation.

(71) Momentive Performance Materials, Inc., 260 Hudson River Road, Waterford, NY 12188 (US)

(84) ARIPO (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW), Eurasian (AM, AZ, BY, KG, KZ, RU, TJ, TM), European (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR), OAPI (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)

x

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